溅射系统
Development of Multi target 2 chamber Sputtering System
多靶双室磁控溅射机的研制
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
利用低频反应磁控溅射制备五氧化二铌光学薄膜.
Bonding of Target Material and Backing Plate for 9900 Sputtering System
9900型靶材与靶托的连接技术
Described is an equipment consisting of several systems as follows: an ion system, having a sputtering ion source and an asymmetric three electrode acceleration tube, operated at 50 keV with a beam current up to 4 mA ( for N+);
本设备由以下系统组成:注入系统,有溅射离子源及不对称三电极加速管,能量50keV,流强4mA(N~+);
Study on Influence of Target Powers on Properties of Diamond-Like Carbon Films Deposited by Mid-Frequency Magnetron Sputtering System
中频磁控溅射制备类金刚石薄膜的功率因素研究
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